磁记录介质材料.pptVIP免费

磁记录介质材料北京航空航天大学于荣海磁记录材料InformationtostoreTemporaryStoragePermanentStorageAudioTapeTapePhotoFloppydiskFloppydiskVideoCDRCDRDVDRDVDRHDDInternetSolidStateDevices(MRAM,Flash,OUM,FRAM)InformationDataandStorageMediaInformationDataandStorageMedia磁记录装置原理图HardDiscs:BitsandBytes>100Gbit/in2demomediaGrainsize~8.5nmMaterial:CoPtCrB*Seagate,NewsletterArealDensity=TrackDensity*LinearDensityThesmallestrecordingunitiscalled“bit”Eachbitcontainshundredsofgrains.HardDiskDrive•Substrate-glass•Magneticmedium–Fe3O4HardDriveDiskGlassMagneticMedium–Fe3O4MAGNETICRECORDINGParticulateRecordingMediaThinFilmRecordingMediaMAGNETICRECORDINGParticulateRecordingMediaThinFilmRecordingMediaSiT.Ox.,SiO2AlNBaMSiT.Ox.,SiO2amorphous-BaMBaM磁记录介质材料磁记录的三种方式的发展水平磁记录比特的晶粒组成（100个以上的晶粒）热稳定性与密度上限垂直磁记录退磁场膜厚与热稳定性分立垂直磁记录减小相互作用热稳定性三种磁记录方式示意图Recordingheadlimit<200Gbits/in2Perpendicular:130Gbits/in2Storagelimit0.6Terabits/in2by2009?nanoparticlesBeyond1Terabits/in2by2020???TrendinMagneticDataStorageDensityTrendinMagneticDataStorageDensityRoadmapforParticulateRecordingDensityNanofabricationNanofabricationmethodscanbedividedintotwocategories:Top-downmethodsExample:lithographyBottom-upmethodsExample:quantumdotsandself-assemblePhotolithographyUVsubstratephotoresistetchantmaskSpincoatingMaskandexposeDevelopEtchingResistremovalFinalProductCanmakecomplex3-Dshapesusinggray-scaletechniquesElectronBeamElectronBeamLithographyandNanofabricationHighMMPMMALowMMPMMAIndiumTinOxideGlassExposureDevelopmentMetaldepositionLiftoffBilayere-beamresiststructure.AhighmolecularweightPMMAisspunontopofaslightlymoresensitivebottomlayeroflowmolecularweightPMMA.TheresistisdevelopedinMIBK:IPAgivinganundercut.Theresistisremovedinaliquidsolventleavingthepattern.NanoparticlesbytheClusterGunNanoparticlesbytheClusterGun液滴沉积过程示意图液滴沉积过程示意图全固态，5~50微米半固态，50~150微米全液态，>150微米半固...