第45卷第3期（总第360期）电镀与精饰2023年3月石墨表面磁控溅射钛膜的结构与工艺参数研究杨岭，潘应君*，郑世恩，朱星宇（武汉科技大学材料与冶金学院，湖北武汉430081）摘要：为解决石墨表面制备的不粘涂层结合力低的问题，可采用钛薄膜作为过渡层以提高结合力。本文采用磁控溅射技术在石墨基片表面制备钛薄膜，通过优化溅射工艺参数，提高钛薄膜的附着力。通过正交试验设计研究溅射功率、溅射气压和沉积时间对钛薄膜组织结构、表面粗糙度以及附着力的影响。利用扫描电镜（SEM）等分析了钛薄膜的微观形貌、物相结构及表面粗糙度，进行划格试验评估了薄膜的附着力。研究得到优化工艺参数为：溅射功率200W，溅射气压1.2Pa，沉积时间50min。薄膜微观呈现岛状结构，颗粒尺寸约150nm。钛薄膜为密排六方α-Ti结构，沿（002）晶面择优生长，这可能与石墨基体的片层状结构有关。溅射工艺参数的优化可以有效提高钛薄膜与石墨基体的附着力。关键词：磁控溅射；钛薄膜；石墨；工艺参数；附着力；粗糙度中图分类号：TG174.444文献标识码：AStructureandprocessparametersoftitaniumfilmspreparedbymagnetronsputteringongraphiteYangLing，PanYingjun*，ZhengShien，ZhuXingyu（CollegeofMaterialsandMetallurgy，WuhanUniversityofScienceandTechnology，Wuhan430081，China）Abstract：Inordertosolvetheproblemoflowbindingforceofnon-stickcoatingpreparedongraphitesurface，titaniumfilmcanbeusedastransitionlayertoimprovethebindingforce.Titaniumfilmswerepreparedongraphitesubstratebymagnetronsputtering.Theadhesionoftitaniumfilmswasimprovedbyoptimizingsputteringprocessparameters.Theeffectsofsputteringpower，sputteringpressureanddepositiontimeonmicrostructure，surfaceroughnessandadhesionofTifilmswereinvestigatedbyorthogonalexperiment.Themicrostructure，phasestructureandsurfaceroughnessofTifilmswereanalyzedbydifferentmethodssuchasSEM，andtheadhesionofTifilmswasevaluatedbylatticetest.Theoptimizedprocessparametersareasfollows：sputteringpower200W，sputteringpressure1.2Pa，depositiontime50min.Themicrostructureofthefilmpresentsanislandstructure，andtheparticlesizeisabout150nm.Thetitaniumfilmshaveadensehexagonalα-Tistructureandgrowalongthe（002）crystalplanepreferentially，whichmaybere...
