Designation:E1634−11StandardGuideforPerformingSputterCraterDepthMeasurements1ThisstandardisissuedunderthefixeddesignationE1634;thenumberimmediatelyfollowingthedesignationindicatestheyearoforiginaladoptionor,inthecaseofrevision,theyearoflastrevision.Anumberinparenthesesindicatestheyearoflastreapproval.Asuperscriptepsilon(´)indicatesaneditorialchangesincethelastrevisionorreapproval.1.Scope1.1Thisguidecoversthepreferredprocedureforacquiringandpost-processingofsputtercraterdepthmeasurements.Thisguideislimitedtostylus-typesurfaceprofilometersequippedwithastage,stylus,associatedscanandsensingelectronics,videosystemforsampleandscanalignment,andcomputerizedsystem.1.2ThevaluesstatedinSIunitsaretoberegardedasstandard.Nootherunitsofmeasurementareincludedinthisstandard.1.3Thisstandarddoesnotpurporttoaddressallofthesafetyconcerns,ifany,associatedwithitsuse.Itistheresponsibilityoftheuserofthisstandardtoestablishappro-priatesafetyandhealthpracticesanddeterminetheapplica-bilityofregulatorylimitationspriortouse.2.ReferencedDocuments2.1ASTMStandards:2E673TerminologyRelatingtoSurfaceAnalysis(Withdrawn2012)33.Terminology3.1Definitions:3.1.1TermsusedinsurfaceanalysisaredefinedinTermi-nologyE673.4.SignificanceandUse4.1Sputtercraterdepthmeasurementsareperformedinordertodetermineasputterrate(depth/time)foreachmatrixsputteredduringasputterdepthprofileorsimilarin-depthtypeanalyses.Fromsputterratevalues,alineardepthscalecanbecalculatedanddisplayedforthesputterdepthprofile.4.2Dataobtainedfromsurfaceprofilometryareusefulinmonitoringinstrumentalparameters(forexample,rastersize,shape,andanyirregularitiesintopographyofthesputteredcrater)usedfordepthprofiles.5.GeneralProcedure5.1Uponcompletingasputterdepthprofile,markthecraterforfutureidentification(onecanmarktheexteriorcorner(s)ofacraterwithfeatures,forexample,lines,holes,etc.,producedusinganunrasteredionbeam).Notethecraterorientationwithrespecttotheothersamplefeatures5.2Placethesampleontheprofilometerstagesurface.Ifthesamplehasanareaoflessth...
